Optoelectronic Properties Improvement of pm-Si:H Films with Silane Flux Variation

L. Hamui, G. Santana

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Resumen

this work describes the effect of silane flux on pm-Si:H films deposited by pecvd, with 3.5 torr, 210 °C and silane flux between 16-40 sccm. The augment of the silane flux increase the deposition rate to 2.3 A/s. The crystalline fraction varies from 9% to 17%. Exodiffusion experiments were related to structural and optical properties to understand their growth by analysis of bonding environment. The hydrogen stability and its amount bonded in these films are enhanced as the flux decreases. The optical gap decrease from 1.76 to 1.7 eV with silane flux. These could improve the stability of photovoltaic devices.

Idioma originalInglés
Título de la publicación alojada2018 IEEE 7th World Conference on Photovoltaic Energy Conversion, WCPEC 2018 - A Joint Conference of 45th IEEE PVSC, 28th PVSEC and 34th EU PVSEC
EditorialInstitute of Electrical and Electronics Engineers Inc.
Páginas2010-2012
Número de páginas3
ISBN (versión digital)9781538685297
DOI
EstadoPublicada - 26 nov 2018
Evento7th IEEE World Conference on Photovoltaic Energy Conversion, WCPEC 2018 - Waikoloa Village, Estados Unidos
Duración: 10 jun 201815 jun 2018

Serie de la publicación

Nombre2018 IEEE 7th World Conference on Photovoltaic Energy Conversion, WCPEC 2018 - A Joint Conference of 45th IEEE PVSC, 28th PVSEC and 34th EU PVSEC

Conferencia

Conferencia7th IEEE World Conference on Photovoltaic Energy Conversion, WCPEC 2018
País/TerritorioEstados Unidos
CiudadWaikoloa Village
Período10/06/1815/06/18

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